InTech-2000 High Speed, Reel to Reel, Pure Indium The InTech -2000 is a high-speed, high efficiency, stable electroplating system designed for the rapid deiti of pure indium at a wide range of current densities. M-Ctact InTech-2000 offers the advantage of being a pure indium, lead-free, plating process providing an ultra-soft deit that yields a uniform grain size, which is an excellent alternative to reduce the tendency for whisker growth. The process results in uniform, matte white deits over a very wide cathode current density range. The resulting deits he excellent reflow properties and are great for press fit applicatis. InTech -2000是一种高速、、稳定的电镀系统，专为在广泛的电流密度下快速沉积纯铟而设计。 InTech -2000具有纯铟无铅电镀工艺的优势，提供超软镀层，产生均匀的晶粒尺寸，这是减少晶须生长趋势的选择。该工艺在极宽的阴极电流密度范围内产生均匀的哑光白色沉积 物。所得到的沉积物具有优异的回流性能，对压滤效果很好。 READ ENTIRE TECHNICAL DATA SHEET BEFORE USING THIS PRODUCT 在使用本产品之前，请阅读完整的技术说明书 Features 特性 Benefits 优点 Operates over a wide current density range 在宽电流密度范围内工作 Uniform plating thickness regardless of part geometry 镀层厚度均匀，不考虑零件几何形状 Analyzable additives 可分析的添加剂 Easy to maintain and cool 易于维护和控制 Simplified effluent treatment 简化污水处理 Envirmentally friendly process 环保工艺 High efficiency 效率高 Csistent plating rate throughout the life of the bath 在镀液的整个使用寿命中保持一致的镀速 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 PROCESS COMPONENTS REQUIRED 所需的工艺组件 InTech -METAL(Cceate: 300 g/L) MSA Acid (MSA: 950 g/L) InTech -2000 A IN-METAL(浓缩:300 g/L) MSA酸(MSA: 950 g/L) InTech 2000 Chemicals/Products Required 化学物质/产品要求 Optimum InTech -METAL 167 mL/L MSA Acid 60 mL/L InTech -2000 A 50 mL/L Deiized Water 724 mL/L 1.Add 500 mL/L Deiized water to tank. 2.Add MSA Acid and allow to mix thoroughly. 3.Add InTech -METAL and allow to mix thoroughly. 4.Add InTech -2000 A and allow to mix thoroughly. 5.Bring soluti level up to final volume with Deiized water. 1.向罐中加入500ml /L去离子水。 2.加入MSA酸，充分混合。 3.加入InTech -METAL，充分混合。 4.加入InTech - 2000a，充分混合。 5.用去离子水使溶液达到最终体积。 We recommend a 10% soluti of MSA Acid as an activati step to remove mild oxides and help prevent drag-in of cinants into the InTech -2000 plating bath. 我们建议使用10%的MSA酸溶液作为活化步骤，以去除温和的氧化物，并有助于防止污染物进入InTech - 2000镀槽。 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 EQUIPMENT 设备 Anodes 阳极 Indium slabs, balls, or chunks, in titanium anode baskets must be kept full to ensure proper corrosi of the anodes. Baskets should be bagged. 钛阳极篮中的铟板、铟球或铟块必须保持满溢，以确保阳极的适当腐蚀。篮子应该装上袋子。 Tanks 罐 Polypropylene, polyethylene, PVDC, or rubber-lined tanks 聚丙烯，聚乙烯，PVDC，或橡胶内衬罐 Pumps 泵 Polypropylene, PVC or PVDC 聚丙烯，PVC或PVDC Filtrati 过滤 5 to 30 micr Dynel or polypropylene cartridge with 4 to 5 turnovers per hour. Ctinuous filtrati is recommended to remove any particulate matter which may fall into the bath. Care should be taken to exclude the eance of air into the filtrati system to minimize foaming. 5至30微米的戴奈尔或聚丙烯墨盒，每小时4至5次周转。建议进行连续过滤，以去除可能落入槽内 的任何颗粒物质。应注意防止空气进入过滤系统，以尽量减少起泡。 Heaters 加热器 PTFE, titanium, stainless steel, or silica-sheathed 聚四氟乙烯，钛，不锈钢或硅护套 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 Equipment Pretreatment: 设 备 预 处 理 ： Solutis Required: 方案要求： Trisodium Phosphate 三钠 Sodium Hydroxide 氢 MSA Acid MSA 酸 15 g/L (2 oz/gal) 15 g/L (2 oz/gal) 10% v/v (100 mL/L Whenever a new plating line is set up, or an old line cverted to a different chemistry, it is advisable to first thoroughly clean and leach all existing equipment: 每当建立新的电镀生产线，或旧生产线转换为不同的化学，建议首先清洁和浸出所有现有设备: 1.Thoroughly wash all tanks and equipment with deiized water. Discard the water. 2.Fill the tanks with a cleaning soluti of 15 g/L (2 oz/gal) trisodium phosphate and 15 g/L (2 oz/gal) sodium hydroxide. Warm to 140 °F and recirculate it for four (4) hours through the system. Discard the soluti. 3.Fill the system with deiized water. Recirculate it for two (2) hours through the system, then discard the water. 4.Add a leaching soluti of 10 % MSA Acid to the system. Recirculate for eight (8) hours, then discard the leaching soluti. 5.Fill the system again with deiized water. Recirculate it for e (1) hour through the system, and then discard the water. 1.用去离子水清洗所有水箱和设备。把水倒掉。 2.用15g /L (2 oz/gal)三钠和15g /L (2 oz/gal)氢的清洁溶液填充槽。加热至140°F，通过系统循环四(4)小时。丢弃解决方案。 3.向系统中注入去离子水。通过系统再循环两(2)小时，然后丢弃水。 4.在系统中加入10% MSA酸的浸出液。再循环八(8)小时，然后丢弃浸出液。 5.再次向系统中注入去离子剂 Chemicals/Products Required 化学物质/产品要求 Range 范围 Optimum Indium (III) Metal 金属铟(III) 40 to 60 g/L 50 g/L Free Methane Sulfic Acid 47 to 67g/L 57 g/L InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 游离甲烷磺酸 InTech -2000 A InTech 2000 40 to 60 mL/L 50 mL/L Temperature 温度 40 to 60 °C (105 to140 °F) 50 °C (122 °F) Agitati 搅 动 Very High, Overflow, Recirculati Cathode Current Density 阴极电流密度 5 to 60 ASD (50 to 600 ASF) Dependant equipment design and producti requirements Anode to Cathode Ratio1 负极比 1:1 to 6:1 Deiti Rate 沉积速率 2 to 3 ?m/min @ 10 ASD by “Hull cell panel plating” InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 Generic process cycle is shown below 一般流程周期如下所示 1.Cathodic Electro-cleaning 2.DI Water rinse 3.Micro-etching 4.DI water rinse 5.Nickel plating 6.DI water rinse 7.10% MSA pre-dip for 10 to 20 secds 8.Indium plating 9.DI water rinse 10.Post-dip/Neutralized (15 to 20 g/L Trisodium Phosphate) 11.DI water rinse 12.Dry and package 1.阴极Electro-cleaning 2.去离子水冲洗 3.Micro-etching 4.去离子水冲洗 5.镀镍 6.去离子水冲洗 7. 10% MSA预浸10 - 20秒 8.镀铟 9.去离子水冲洗 10.浸后/中和(15 - 20g /L三钠) 11.去离子水冲洗 12.干燥和包装 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 SOLUTION MAINTAINANCE 解决方案和维护 As a general guideline, 300 to 400 mL/1000 Amp-hours of InTech -2000 A may be used. The additive cceati in the bath can also be mitored by UV-Visible Spectrophotometry (see attached procedure). Actual replenishment rates will vary up part design, drag-out, plating equipment and operati parameters. 作为一般指南，可使用300至400 mL/1000安培小时的M-接触器IN-2000 A。 浴液中的添加剂浓度也可以通过紫外-可见分光光度法进行监测（见所附程序）。实际补充率将因零件设计、拉伸、电镀设备和操作参数而变化。 Periodic analysis and maintenance of the bath compents is essential to obtaining optimum performance. Frequency of analysis depends bath throughput. Ensure that the bath is at operating volume and temperature, and thoroughly mixed before sampling. 定期分析和维护镀液组件是获得性能的必要条件。分析频率取决于浴槽吞吐量。取样前，确保液浴 处于工作体积和温度，并充分混合。 Analysis of Indium by Titrati Method 滴定法分析铟Required Reagents 所需试剂 1N NaOH Glacial acetic acid 0.0575 M Disodium EDTA standard soluti 0. 1% PAN indicator 1N氢 冰醋酸 0.0575 M EDTA二钠标准溶液 0.1% PAN指示器 1.Pipette 1 mL working soluti, put in 250 mL Erlenmeyer flask, add about 100 mL DI water and mix well 2.Neutralize soluti with 1N NaOH (~2 mL) and soluti will turn white turbid 3.Add about 3 mL of glacial acetic acid to dissolve the turbidity and the soluti will turn back clear 4.Add 5 drops of PAN indicator and the soluti will turn red 5.Titrate with 0.0575 M Disodium EDTA soluti from red to yellow end point, record the volume (V in mL) of EDTA soluti titrated 1.移液1 mL，放入250 mL的Erlenmeyer烧瓶中，加入约100 mL的去水，混合均匀 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 2.用1N NaOH (~ 2ml)中和溶液，溶液变成白色浑浊3.加入约3ml冰醋酸溶解浑浊，溶液变清 4.加入5滴PAN指示剂，溶液变红 5.用0.0575 M EDTA溶液从红色终点滴定至黄色终点，记录所滴定EDTA溶液的体积(V, mL) Calculatis 计算 Indium metal ctent (g/L) = V x 5.75 (g/L) 金属铟含量(g/L) = V × 5.75 (g/L) Analysis of Indium Metal by Inductively Coupled Plasma (ICP) 电感耦合等离子体(ICP)分析金属铟 Required Reagents 所需试剂 1.Nitric Acid Soluti (5%) – prepared by diluting an accurately measured volume of cceated nitric acid with a known volume of deiized water. 1.溶液(5%)-通过稀释测量体积的 浓和已知体积的去离子水。 2.Indium Standard Stock Soluti (10,000 mg/L) 2.铟标准原液(10,000 mg/L) 3.Indium Calibrati Standards – 0.0 ppm, 100 ppm, 200 ppm, 300 ppm and 400 ppm; prepared by pipetting an accurately measured volume of indium standard stock soluti (10,000 mg/L) into a 10 ml volumetric flask and diluting to the mark with deiized water. Note: the calibrati curve range may be adjusted depending the estimated amount of indium in the prepared sample. 3.铟校准标准- 0.0 ppm, 100ppm, 200ppm, 300ppm和400ppm; 通过移液测量体积的铟标准原液制备 (10,000 mg/L)放入10ml容量瓶中，用去离子水稀释至标记。 注:校正曲线范围可根据预估量进行调整 制备样品中的铟。 Analysis Procedure 分析过程 1.The Indium (In) signal is detected at the 303.936 {111} (Radial) welength. 1. 铟(In)信号在303.936{111}(径向)波长被检测到。 2.Quantitati of indium is accomplished by fitting the signal counts of Indium to that of a calibrati curve. 2.铟的定量是通过将铟的信号计数拟合到a的信号计数来完成的 校准曲线。 3.Aspirate indium calibrati standards directly into the plasma. Record counts for indium using the welength 303.936 {111} (Radial). Repeat reg three times and erage the results. 3.将铟校准标准品直接吸入血浆中。铟的记录计数 使用波长303.936{111}(径向)。重复阅读三次，取平均数 结果。 4.Create a calibrati curve for indium by plotting intensity (counts) vs. indium cceati. 4.通过绘制强度(计数)与铟浓度的关系，创建铟的校准曲线。 5.Transfer 1.0 ml of makeup bath soluti into a 200 ml volumetric flask and dilute to the mark with 5% nitric acid soluti (200 times diluti). 5.将1.0 ml化妆浴液转移到一个200 ml的容量瓶中，稀释到 用5%溶液(稀释200倍)标记。 6.Aspirate the diluted makeup bath soluti directly into the plasma. Record counts for indium using the welength 303.936 {111} (Radial). Repeat reg three times and erage the results. 6. 将稀释的化妆浴液直接吸入血浆中。使用波长303.936{111}(径向)记录铟的计数。重复阅读三次，取平均值。 Calculatis 计算 Calculate the indium cceati in the makeup bath soluti as follows: 计算化妆浴液中铟的浓度如下: [In] (mg/L) = （? canpSe–B）x DF n where A sample is the indium counts of the diluted makeup bath sample soluti, M is the slope calculated from the calibrati curve, B is the y-intercept calculated from the calibrati curve, and DF is the diluti factor (200) 式中A样品为稀释后的化妆浴样品溶液的铟计数， M为标定曲线计算的斜率， B为标定曲线计算出的y轴截距 DF为稀释系数(200) A nalysis of Free Acid 游 离 酸 分 析 Required Reagents 所需试剂 4% Ammium Oxalate 1.0 N NaOH Methyl Red indicator 4%铵 1.0 N NaOH 红色指示器 1.Pipet a 5 mL sample of the plating bath into a 250 mL Erlenmeyer flask. 2.Add 100 mL of 4 % Ammium Oxalate soluti to the flask and mix well. 3.Add 20 drops of Methyl Red indicator soluti. 4.Titrate with 1.0 N NaOH to a yellow endpoint. Beyd the endpoint, the soluti becomes turbid 1.用移液管将5ml的镀液样品移入250ml的Erlenmeyer烧瓶中。 2.在烧瓶中加入100毫升4%铵溶液，混合均匀。 3..加入20滴红指示剂溶液。 4.用1.0 N NaOH滴定至黄色终点。在端点之外，解决方案变成 浑浊的 Calculatis 计算 MSA free acid (g/L) = (mL, 1.0 N NaOH) x (14.5) MSA(g/L) = (mL, 1.0 N NaOH) x (14.5) S pectrophotometric analysis InTech -2000 A 分 光 光 度 分 析 InTech -2000 Required Reagents/Materials 所需试剂/材料 UV-Visible Spectrophotometer 1.0 cm-quartz or disable-methacrylate cuvettes for UV-Visible 紫外可见分光光度计 1.0厘米石英或一次性丙烯酸酯比色皿用于紫外可见 Soluti Preparati 解决方案准备 1.Use DI water as blank soluti 2.Sample bath 2. 样本浴 Dilute the make-up bath 10x by pipetting 5 mL of the plating bath and put in 50 mL volumetric flask. Top with DI water to mark and mix well. 用移液法将5 mL电镀液稀释10倍，加入50 mL 容量瓶。在上面加入去离子水标记并混合均匀。 Measurements 测 量 Measure the absorbance of the filtered sample soluti at 286.0 nm, using the DI water as a reference. 在286.0 nm处测量过滤后的样品溶液的吸光度，以去离子水作为吸光度 参考。Calculate the cceati of InTech -2000 A (ml/L) using the following equati: 使用以下公式计算InTech -2000 A的浓度(ml/L): M-Ctact IN-2000 A (ml/L) = Absorbance 0.0057 It is recommended that the company/operator read and review the Safety Data Sheets for the appropriate health and safety warnings before use. 建议公司/操作人员阅读和审查安全数据表 使用前适当的健康和安全警告。 Safety Data Sheets are ailable. 安全数据表可用。 Prior to using any recommendatis or suggestis for waste treatment, the user is required to know the appropriate local/state/federal regulatis for -site or off-site treatment which may require permits. If there is any cflict regarding our recommendatis, local/state/federal regulatis take precedent. 在使用任何有关废物处理的建议或建议之前，用户必须 了解当地/州/联邦对现场或非现场处理的适当规定 需要许可。如果我们的建议有任何冲突，地方/州/联邦 法规有先例可循。 InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 Product 产品 InTech -METAL M-Ctact 金属 MSA Acid MSA 酸 InTech -2000A InTech -2000A Product codes are in 5 gall package sizes. Please ctact your Customer Service Representative for additial package sizes. 产品代码是在5加仑包装尺寸。请与您的客户服务联系 额外包装尺寸的代表。 To cfirm this document is the most recent versi, please ctact altchem@aliyun.com www.zhgdukj.com 要确认此文件是版本，请联系altchem@aliyun.com www.zhgdukj.com Also read carefully warning and safety informati the Safety Data Sheet. This data sheet ctains technical informati required for safe and ecomical operati of this product. READ IT THOROUGHLY PRIOR TO PRODUCT USE. 同时仔细阅读安全数据表上的警告和安全信息。本数据表包含本产品安全、经济运行所需的技术信息。使用产品前 请仔细阅读。 DISCLAIMER: All statements, technical informati and recommendatis ctained herein are based tests we believe to be reliable, but the accuracy or completeness thereof is not guaranteed. No statement or recommendati shall cstitute a representati unless set forth in an agreement signed by officers of seller and manufacturer. NO WARRANTY OF MERCHANTABILITY, WARRANTY OF FITNESS FOR A PARTICULAR PURPOSE OR ANY IMPLIED WARRANTY IS MADE. The following warranty is made in lieu of such warranties and all other warranties, express, implied, or statutory. Products are warranted to be free from defects in material and workmanship at the time sold. The sole obligati of seller and manufacturer under this warranty shall be to replace any ncompliant product at the time sold. Under no circumstances shall manufacturer or seller be liable for any loss, damage or expense, direct, indirect, incidental or csequential, arising out of the inability to use the product. Notwithstanding the foregoing, if products are supplied in respse to a customer request that specifies operating parameters beyd those stated above, or if products are used under cditis exceeding said parameters, the customer by acceptance or use thereof assumes all risk of product failure and of all direct, indirect, incidental and csequential damages that may result from use of the products under such cditis, and agrees to exerate, indemnify, defend and hold harmless MacDermid, Incorporated and its affiliates therefrom. No suggesti for product use nor anything ctained herein shall be cstrued as a recommendati to use any product in a manner that infringes any patent or other intellectual property rights, and seller and manufacturer assume no respsibility or liability for any such infringement. InTech-2000 电镀纯铟 Versi: 01 Doc.-No.: 201801-001 免责声明:本文中包含的所有陈述、技术信息和建议均基于我们认为可靠的测试，但不保证其准确性或完整性。除 非在卖方和制造商官员签署的协议中规定，否则任何陈述或建议均不构成陈述。无 作出适销性、适用于特定用途的保证或任何默示保证。以下保证代替上述保证和所有其他明示、暗示或法定的保证。产品保证是免费的